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| NanoCalc Reflectometry System |
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Analyze Layers from 10nm in Thickness
The optical properties of thin films arise from reflection and interference. The NanoCalc Thin Film Reflectometry System allows you to analyze the thickness of optical layers from 10nm to ~250 µm. You can observe a single thickness with a resolution of 0.1nm. Depending on your software choice, you can analyze single-layer or multilayer films in less than one second and can measure the thickness and removal rates of semiconductor process films or anti-scratch coatings and anti-reflection coatings. |
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Theory of Operation
The two most common ways to measure thin film characteristics are spectral reflectance/transmission and ellipsometry. NanoCalc utilizes the reflectance method and measures the amount of light reflected from a thin film over a range of wavelengths, with incident light mormal to the sample surface. |
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Search by n and k
As many as three layers can be specified in a film stack. The various films and substrate materials can be metallic, dielectric amorphous or crystalline semiconductors. The Nanocalc Software includes a large library of n and k values for the most common materials. You can edit and add to this library. Material types can also be defined by equation or dispersion formulas. |
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Applications
NanoCalc Thin Film Reflectometry Systems are ideal for in situ, on-line thickness measurements and removal rate applications, and can be used to measure the thickness of oxides, SiNx, Photoresist and other semiconductor process films. NanoCalc systems measure anti-reflection coatings, anti-scratch coatings and rough layers on substrates such as steel, aluminium, brass copper, ceramics and plastics. |
| PRODUCT SPECIFICATIONS |
| Item |
Wavelength |
Thickness |
Light Source |
| NC-UV-VIS-NIR |
250-1100 nm |
10 nm-70 µm |
Deuterium & Tungsten Halogen |
| NC-UV-VIS |
250-850 nm |
10 nm-20 µm |
Deuterium & Tungsten Halogen |
| NC-VIS-NIR |
400-1100 nm |
20 nm-100 µm
Optional 1 µm-250 µm |
Tungsten Halogen |
| NC-VIS |
400-850 nm |
50 nm-20 µm |
Tungsten Halogen |
| NC-NIR |
650-1100nm |
70 nm-70 µm |
Tungsten Halogen |
| NC-NIR-HR |
700-978nm |
1 µm-250 µm |
Tungsten Halogen |
| NC-512-NIR |
900-1700nm |
50 nm-200 µm |
High-power Tungsten Halogen |
| SpecEI Ellipsometer System |
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Full Spectral Range in Easy-to-use System
The SpecEl-2000-VIS Ellipsometer measures polarized light reflected from the surface of a substrate to determine the thickness and refractive index of the material as a function of wavelength. The SpecEl is controlled via a PC. Measure refractive index, absorbance and thickness with the touch of a button. |
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All-in-one Accurate System
The SpecEl houses an integrated light source, a spectrometer and two polarizers fixed to 70?. It also includes a PC with a 32-bit Windows operating system. The SpecEl can detect a single layer as thin as 0.1 nm and up to 5 ?m thick. In addition, it can provide refractive indices to 0.005?. |
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SpecEI Software and "Recipe" Files
In SpecEl Software, you can configure and save experiment method files for one-step analysis. after creating a "recipe," you can select the recipe to execute the experiment.
This screen shot from the SpecEl Software demonstrates the Psi and Delta values you can calculate for thickness, refractive index and absorbance. |
| PRODUCT SPECIFICATIONS |
| Thickness |
Light Source |
| Wavelength Range |
380-780 nm (Standard) or 450-900 nm (Optional) |
| Optical Resolution |
4.0 nm FWHM |
| Accuracy |
0.1 nm thickness; 0.005% refractive index |
| Angle of Incidence |
70o |
| Film Thickness |
1-5000 nm for single transparent film |
| Spot Size |
2 mm x 4 mm (Standard) or 200 µm x 400 µm (Optional) |
| Sampling time |
3-15 seconds (minimum) |
| Kinetic logging |
3 seconds |
| Mechanical tolerance |
Height +/- 1.5 mm, angle +/- 1.0o |
| Number of layers |
Up to 32 layers |
| Reference |
Not applicable | |
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